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MPCVD Rough Large Lab Created Diamonds VVS Diamond Plate Colorless CVD Substrate

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MPCVD Rough Large Lab Created Diamonds VVS Diamond Plate Colorless CVD Substrate

Name: MPCVD Rough Large Lab Created Diamonds VVS Diamond Plate Colorless CVD Substrate
Brand: Infi
Price: 1 USD

Wholesale MPCVD Rough Large Lab Created Diamonds VVS Diamond Plate Colorless CVD Substrate from china suppliers

Brand Name : Infi

Model Number : JSD

Place of Origin : Hunan, China

MOQ : 1-1000PCS

Price : To be negotiated

Payment Terms : L/C, T/T, D/P

Supply Ability : 1-1000CT/3DAYS.>1000CT/To be negotiated

Delivery Time : 5-8 WORK DAYS

Packaging Details : 1: Plastic bags, with bubble sheet covered, then to paper cartons; 2: Plastic bottles, with bubble sheetproduct description

Hardness (microhardness) : 80～150GPa

Young's modulus : 1150～130OGPa

coefficient of friction : 0.05~0.05

Thermal expansion coefficient : 10-.K-l

Thermal conductivity : 1500-2000 w/ (m·K)

nitrogen content : <50ppm

Color : Colorless

Crystal growth process : CVD

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12x12x0.3mm MPCVD Raw Large Rough Diamonds VVS Diamond Plate CVD Seeds CVD Substrate Colorless Seeds

Product description:

Single crystal diamond CVD (chemical vapor deposition) refers to a type of diamond that is produced using the CVD process. In this process, a mixture of carbon-containing gases is decomposed under controlled conditions, resulting in the formation of a single crystal diamond layer on a substrate.

Prodct details:

CVD Single Crystal Diamond Properties:

Single crystal diamond CVD is known for its exceptional hardness and thermal conductivity, which makes it useful for a range of industrial and scientific applications, such as cutting and grinding tools, heat spreaders, and optical components.

Compared to other forms of synthetic diamond, single crystal diamond CVD has a highly ordered crystal structure, which gives it improved physical and mechanical properties. This makes it a desirable material for a range of high-performance applications, where its hardness and thermal conductivity are important factors.

In summary, single crystal diamond CVD is a type of synthetic diamond that is produced using the CVD process and is characterized by its exceptional hardness and thermal conductivity. It has a wide range of applications in industries such as manufacturing, electronics, and optics.

Using the microwave plasma-assisted chemical vapor deposition method (MPACVD), the microwave resonance system is used to break down the carbon-containing gas and corrosive gas at low and medium pressures to generate plasma, and the growth strategy of the single-crystal diamond crystal model is designed, so that the diamond crystal can be used Homoepitaxial growth is achieved in the 100 and 110 and 111 growth directions of the type IIb diamond seed crystal

Size Available:

Suggested application	Sustrated/seeds for single crystal CVD growth
Crystal growth process:	CVD
Color:	Colorless
Available size :	3x3x0.3 4x4x0.3 5x5x0.3 6x6x0.3 7x7x0.3 8x8x0.3 9x9x0.6 10x10x0.3 11x11x0.3 12x12x0.3 13x13x0.3 15x15x0.3
Benefits:	The length, width and thickness are all positive tolerance,
	There are no polycrystalline black spots, cracks under the 20x magnifying glass.
	The cutting is perfect without small missing corners.
	The stress distribution is uniform under the polarizer.
Orientation:	4pt/100
Lateral Dimensions Measured	to smaller side
Edges	Laser Cut
Edge Orientation	<100> edges
Face Orientation	{100} faces
Lateral Tolerance:	L + W tolerance (0, +0.3 mm), thickness tolerance (0, +0.1mm).
Side 1, Roughness, Ra	Two sides polished, Ra < 20 nm One side polished, Unpolished
Boron Concentration [B]:	<0.05 ppm
Nitrogen Concentration:	< 20 ppm

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